Maximization of Layout Printability/Manufacturability by Extreme Layout Regularity
Tejas Jhaveri, Vyacheslav Rovner, Larry Pileggi, Andrzej J. Strojwas, et al., “Maximization of Layout Printability/Manufacturability by Extreme Layout Regularity”, Journal of Micro/Nanolithography, MEMS, and MOEMS, Vol 6 (03), January 2007.
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