OPC Simplification & Mask Cost Reduction using Regular Design Fabrics

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Tejas Jhaveri, Andrzej Strojwas, Larry Pileggi & Vyacheslav Rovner, “OPC Simplification & Mask Cost Reduction using Regular Design Fabrics”, SPIE Advanced Lithography Conference, February 2009.

Simplify to Survive: Prescriptive Layouts Ensure Profitable Scaling to 32nm and Beyond

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Lars Liebmann, Larry Pileggi, Jason Hibbeler, Vyacheslav Rovner, Tejas Jhaveri, Greg Northrop, “Simplify to Survive: Prescriptive Layouts Ensure Profitable Scaling to 32nm and Beyond”, SPIE Advanced Lithography Conference, February 2009.