Regular Fabrics for Nano-Scaled CMOS Technologies
L. Pileggi and A.J. Strojwas, “Regular Fabrics for Nano-Scaled CMOS Technologies”, International Solid State Circuits Conference (invited presentation), February 2006.
Archive for month: February, 2006
Maximization of layout printability/manufacturability by extreme layout regularity
/0 Comments/in Conference, Electronic Design Automation, Publications /by awpT. Jhaveri, L. Pileggi, V. Rovner, A.J. Strojwas, “Maximization of layout printability/manufacturability by extreme layout regularity”, SPIE 31st International Symposium on Microlithography Symposium (invited presentation), February 2006.
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